題名：新規なエアロゾル化ガスデポジションによるアルミナ絶縁膜の作製

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E. Fuchita, H. Tanimoto and Y. Sakka : J. Jpn. Soc. Powder Powder Metallurgy, 67 (2020) 220-223.

 

Fig. 2 Illustrations of nozzle, target, mask and substrate at deposition site arrangement. Geometry of target type AGD with mask.

 

Fig. 5 Volt/thickness-ampere characteristics of T-AGD alumina films at 105 deg. target angle with mask (A) 99 deg. angle.